Electron Beam Lithography System with Sample Stage Controlled by Laser Interferometry

• Subject Area: Condensed Matter Physics
• Term: Funded in 2024
• Project identifier: Deutsche Forschungsgemeinschaft (DFG) - Project number 539301864

The proposed electron beam lithography system is intended to expand the existing nanostructuring capabilities at the Core Facility nano.lab of the University of Konstanz. The requirements for precision and scalability in manufacturing have become increasingly important in recent years. In this context, electron beam lithography represents a possibility for nanostructuring that extends across a wide range of research areas. In SFB 1432, this technique is of central importance and can be applied extremely flexibly in the fields of nanooptics, nanoelectronics, nanomechanics and nanomagnetism. In addition, research into hybrid nanostructures is expected to provide new concepts in the field of organic solar cells. However, the flexibility of the lithographic technique also allows its use in biology and chemistry, such as the study of biomolecular transport processes or the investigation of the critical behavior of collectives.

• DFG Programme: Major Research Instrumentation
• Major Instrumentation: Elektronenstrahllithographiesystem mit laserinterferometrisch gesteuertem Probentisch (Teilfinanzierung)
• Instrumentation Group: 0910 Geräte für Ionenimplantation und Halbleiterdotierung
• Applicant Institution: Universität Konstanz
• Leader: Professor Dr. Alfred Leitenstorfer