Electron Beam Lithography System

• Fachliche Zuordnung: Physik der kondensierten Materie
• Förderung: Förderung in 2015
• Projektkennung: Deutsche Forschungsgemeinschaft (DFG) - Projektnummer 281418483

The head of the group is a leading researcher of topological insulators (Tls) and topological superconductors (TSCs). Our group has been doing research at Osaka University, but is moving to the University of Cologne to focus more on the fundamental physics of Tis and TSCs. One of the objectives of our research is to discover novel quantum phenomena in Tis and TSCs, which requires fabrications of state-of-the-art nanodevices based on these materials. The electron beam lithography (EBL) system is an essential tool for device fabrications at the nanometer scale, and our group is already using this tool to fabricate various devices at Osaka. However, there is unfortunately no user facility for nano-fabrications at the University of Cologne, and hence it is impossible for us to continue doing the research in this core area without buying a new EBL system. Therefore, in order for us to start a successful research activity in Cologne, it is of utmost importance that an EBL system is purchased without delay as a key instrumentation of our group.

• DFG-Verfahren: Forschungsgroßgeräte
• Großgeräte: Electron Beam Lithography System
• Gerätegruppe: 0910 Geräte für Ionenimplantation und Halbleiterdotierung
• Antragstellende Institution: Universität zu Köln
• Leiter: Professor Dr. Yoichi Ando