Forschung und Entwicklung eines Nanostrukturdepositionsverfahrens

• Antragsteller: Professor Dr. Heiko Jacobs; Dr.-Ing. Thomas Stauden
• Fachliche Zuordnung: Beschichtungs- und Oberflächentechnik ; Chemische und Thermische Verfahrenstechnik ; Herstellung und Eigenschaften von Funktionsmaterialien
• Förderung: Förderung von 2013 bis 2021
• Projektkennung: Deutsche Forschungsgemeinschaft (DFG) - Projektnummer 247352488

• Erstellungsjahr: 2021

Zusammenfassung der Projektergebnisse

The research provided partial funding for the graduation and qualification of three doctoral research assistants. The research focused on the following goals: (1) gaining full control and understanding of the key parameters and merging them with computations, (2) understanding in how the gas ion concentration, pressure, carrier gas flow rate, physical dimension, or particle size impact the structures that can be formed. Good progress was made on the two goals and a total number of 9 journal papers plus 2 ECS abstracts have been published.

Projektbezogene Publikationen (Auswahl)

• Approaching Gas Phase Electrodeposition: Process and Optimization to Enable the Self‐Aligned Growth of 3D Nanobridge‐Based Interconnects, Advanced Materials 2016, 28 (9), 1770-1779
  Fang, J.; Schlag, L.; Park, S.C.; Stauden, T.; Pezoldt. J.; Jacobs. H.O.
  
• Self Aligning Growth of Nanoparticle-Based Interconnects, IEEE 13th Nanotechnology Materials and Devices Conference (NMDC), 2018, 1-4
  Schlag, L.; Isaac, N.A.; Nahrstedt, H.; Reiprich, Pezoldt, J.; Jacobs, H.O.
  
• Corona Assisted Gallium Oxide Nanowire Growth on Silicon Carbide. J. Cryst. Growth 2019, 509, 107–111
  Reiprich, J.; Kups, T.; Schlag, L.; Isaac, N. A.; Biswas, S.; Breiling, J.; Schaaf, P.; Stauden, T.; Pezoldt, J.; Jacobs, H. O.
  
• Corona Discharge Assisted Growth Morphology Switching of Tin-Doped Gallium Oxide for Optical Gas Sensing Applications. Cryst. Growth Des. 2019, 19 (12), 6945–6953
  Reiprich, J.; Isaac, N. A.; Schlag, L.; Hopfeld, M.; Ecke, G.; Stauden, T.; Pezoldt, J.; Jacobs, H. O.
  
• Electrodeposition of Aluminium–Nickel Films in 1-Butyl-1- Methylpyrrolidinium-Bis (trifluoromethylsulfonyl) Amide, A Ispas, L Schlag, L Eggert, R Böttcher, A Bund, HO Jacobs, ECS Meeting Abstracts, 2019, 963
  Ispas, A.; Schlag, L.; Eggert, L.; Böttcher, R.; Bund, A.; Jacobs, H.O.
  
• Gas Phase Electrodeposition Enabling the Programmable Three-Dimensional Growth of a Multimodal Room Temperature Nanobridge Gas Sensor Array. ACS Applied Materials & Interfaces 2019,11 (36),33497-33504
  Isaac, N.A. ; Schlag, L.; Reiprich, J.; Katzer, S.; Nahrstedt, H.; Pezoldt, J.; Stauden, T.; Jacobs, H.O.
  
• Combinatorial gas phase electrodeposition for fabrication of three-dimensional multimodal gas sensor array. Materials Today: Proceedings 2020 (33), Part 6, 2451-2457
  Isaac, N.A. ; Schlag, L.; Katzer, S.; Nahrstedt, H.; Reiprich, J.; Pezoldt, J.; Stauden, T.; Jacobs, H.O.
  
• Localized and Programmable Chemical Vapor Deposition Using an Electrically Charged and Guided Molecular Flux. ACS Nano 2020, 14 (10) 12885–12894
  Reiprich, J.; Isaac, N. A.; Schlag, L.; Kups, T.; Hopfeld, M.; Ecke, G.; Stauden, T.; Pezoldt, J.; Jacobs, H. O.
  
• Self-Aligning Ruthenium Interconnects. IEEE International Interconnect Technology Conference (IITC), 2020, 82-84
  Schlag, L.; Grau, R.; Hossain, M.; Nahrstedt, H.; Isaac, N.A.; Reiprich, Pezoldt, J.
  
• Nanoparticle gas phase electrodeposition: Fundamentals, fluid dynamics, and deposition kinetics, Journal of Aerosol Science 2021, 151, 105652
  Schlag, L.; Isaac, N.A.; Nahrstedt, H.; Reiprich, Ispas, A.; Stauden, T.; Pezoldt, J.; Bund, A.; Jacobs, H.O.