Analytical and statistical modeling of nanoparticle contamination of critical surfaces under low pressure conditions

• Antragsteller: Dr.-Ing. Christof Asbach
• Fachliche Zuordnung: Mechanische Verfahrenstechnik
• Förderung: Förderung von 2006 bis 2009
• Projektkennung: Deutsche Forschungsgemeinschaft (DFG) - Projektnummer 21500615

The proposed project is to statistically study the risk of nanoparticle contamination of critical surfaces under low pressure conditions. Nanoparticle contamination at low pressure is currently a major issue in the semiconductor industry, as the deposition of particles can e.g. make the very valuable lithographic photomasks useless. The main goal of the project is to develop a complete analytical model that distinguishes between inertial particles, traveling at relatively high velocities, where Brownian motion does not play a significant role and particles that travel at low or no initial velocity that are prone to Brownian motion. A deterministic analytical model for the first case of inertial particles has already been developed by the applicant that predicts whether particles are deposited due to impaction. The model needs to be extended to cover the Brownian motion statistically under different situations, including external forces such as thermophoresis and electrophoresis to protect the surface. The model can then be used as a standard tool to predict the risk of nanoparticle contamination under low pressure conditions. It will be easy to handle as it will only use analytically solvable equations that do not require major computational resources. The model results will be experimentally validated at the facilities of the cooperation partner at the University of Minnesota.

• DFG-Verfahren: Sachbeihilfen
• Internationaler Bezug: USA
• Beteiligte Person: Professor Dr. David Y.H. Pui