Project Details
Ultradoped GeSn-based plasmonic antennas and GeSn/Si plasmon-enhanced heterojunction photoemission infrared photodetectors on the Si platform
Applicants
Yonder Berencén, Ph.D.; Professorin Dr. Inga Fischer
Subject Area
Electronic Semiconductors, Components and Circuits, Integrated Systems, Sensor Technology, Theoretical Electrical Engineering
Term
since 2023
Project identifier
Deutsche Forschungsgemeinschaft (DFG) - Project number 528206533
The project aim is to investigate strategies for obtaining highly n-doped GeSn-alloys and successfully demonstrate their potential for two applications in antenna structures for light amplification and hot-electron photodetection, which can be realized on the cost-effective Si platform for possible applications in THz optoelectronics and IR CMOS image sensors, respectively. Our proposal focuses on GeSn material research as a first step in order to leverage the potential of heavily doped Ge1-xSnx alloys by in-situ molecular beam epitaxy and ex-situ implantation techniques, which are followed by post-growth thermal treatment. Secondly, our plan is to investigate the use of resonances in antenna structures made from highly n-doped GeSn alloys for signal amplification in spectroscopic applications at mid-IR wavelengths. Finally, our plan is to investigate antenna structures obtained from the highly doped GeSn layers for applications in photoemissive hot-electron photodetection. This approach can potentially enable fully CMOS-compatible infrared sensing of IR light.
DFG Programme
Research Grants
International Connection
Taiwan
Partner Organisation
National Science and Technology Council (NSTC)
Cooperation Partner
Professor Dr. Ing-Song Yu