Direct Writer for MicroNano-Structuring

• Subject Area: Systems Engineering
• Term: Funded in 2022
• Project identifier: Deutsche Forschungsgemeinschaft (DFG) - Project number 501120556

In microtechnology, a distinction is made between mask-based and direct-writing lithographic patterning processes. With a direct-writing patterning process, the microstructure is projected directly onto the resist layer of the actual substrate with the aid of a UV light modulator or "written" with the UV laser beam in the vector/raster mode process. Especially in the research environment, maskless patterning saves time, money and energy. In addition, a direct-writing patterning process can be used to respond much more flexibly to changing microstructure requirements. The applicant Institute of Microtechnology (IMT) has so far exclusively used the mask-based structuring process. A mask writer for the production of the lithography masks and a mask aligner for the substrate exposure are currently available for this purpose. The mask writer was purchased in 2002 and therefore no longer corresponds to the current state of the art. This primarily concerns the minimum possible pattern width or resolution (800 nm) and secondarily the time required for complete exposure of a lithography mask (8 to 16 hours). In principle, the mask writer can also be used in direct-writing mode. However, with the exposure times mentioned, this is hardly practical. It is also not used because no structures significantly smaller than 1 µm can be generated. In order to bring the structuring process up to the best possible technological level and thus give research at the IMT an edge over conventional processes already in industrial use, a new structuring system is to be procured. It is intended to halve the minimum structure widths and reduce the time required to process a substrate to a level acceptable in research. The structuring system should be very flexible in use, which is only possible with a direct-writing process. In addition, it should have a new function compared to the existing equipment with the so-called gray scale exposure, with which an innovative 3D structuring is possible due to the additional depth information. Lithographic structuring is used in almost every research project worked on at the IMT. With the new direct writer, many more variations of micro/nanostructuring will be possible. This leads to the expectation that completely new solutions for existing research tasks can be worked out and new ideas for future research approaches can be developed. The IMT could thus clearly distinguish itself from research institutions with an otherwise similar technological orientation. Innovative research approaches made possible in this way can be published more prominently and are more attractive for transfer to future, e.g. industrial, users.

• DFG Programme: Major Research Instrumentation
• Major Instrumentation: Direct Writer für die MikroNano-Strukturierung
• Instrumentation Group: 0910 Geräte für Ionenimplantation und Halbleiterdotierung
• Applicant Institution: Technische Universität Braunschweig
• Leader: Professor Dr. Andreas Dietzel