UHV Sputteranlage

• Subject Area: Materials Engineering
• Term: Funded in 2015
• Project identifier: Deutsche Forschungsgemeinschaft (DFG) - Project number 269836337

The present proposal applies for a UHV sputter system to create precursor metal and alloy films for the growth of highly defined anodic oxide nanostructures. We will generate gradient metals, metastable alloys and defined superlattice structures to provide otherwise not or only hardly achievable thin film metal alloys and structures (gradients, stacks). The films will be produced on several substrate materials like transparent conductive oxides, silicon or metal back-contacts. The deposited metals will be converted via anodic oxidation into self-ordered metal oxide semiconductors in nanotubular form designed for various applications. For example, the use as photocatalytic light absorber and energy converter makes these layers highly interesting, e.g., in specific photocatalytic reactions. By applying additionally co- and gradient-sputtering, virtually endless possibilities to create band-gap engineered tailored electrodes for water-splitting, solar-, storage- and energy devices are possible.

• DFG Programme: Major Research Instrumentation
• Major Instrumentation: UHV Sputteranlage
• Instrumentation Group: 8330 Vakuumbedampfungsanlagen und -präparieranlagen für Elektronenmikroskopie
• Applicant Institution: Friedrich-Alexander-Universität Erlangen-Nürnberg
• Leader: Professor Dr. Patrik Schmuki