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Ion implantation engineering of Si-Mn alloys with high-temperature ferromagnetism

Subject Area Experimental Condensed Matter Physics
Term from 2015 to 2018
Project identifier Deutsche Forschungsgemeinschaft (DFG) - Project number 260481135
 
Final Report Year 2019

Final Report Abstract

Silicon based alloys with Mn-ions are a potential candidate for the spintronic applications, as they exhibit complex electric and magnetic phenomena which can be effectively utilized as the integrated-circuit elements in the contemporary microelectronic technology. The Si1-xMnx alloys shows high-temperature ferromagnetism at low Mn concentration x ~ 0.05 – 0.1, but the small solubility of Mn-ions in Si leads to the formation of MnSi1.7 nanoparticles, which drives the system in an inhomogeneous phase and makes it irrelevant for the technological applications. However, a high Mn concentration in the Si1-xMnx alloys screens the precipitation of different inhomogeneous magnetic phases with high Curie temperature (TC). In this work, a set of Si1-xMnx alloy thin films alloy were prepared by the PLD technique on Al2O3 (0001) substrate. By varying the laser fluence during deposition and the Mn-ion implantation parameters, we have tailored a high temperature homogenous ferromagnetic phase in Si1-xMnx films. By using Mn ion implantation, we can turn on/off the high temperature ferromagnetism in Si1-xMnx films. In the other work, we have studied the implications of He-ion irradiation in complex oxides films such as, NiCo2O4, and CaRuO3. In these studies, we have achieved the unprecedented control over the physical properties by implementing various effects like structural variation, defects, oxygen vacancies, and interstitials.

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